The Millios™ millisecond (ms) anneal system is Mattson Technology’s solution for ultra-shallow junction formation, advanced silicides and other processes requiring extremely short anneal times with precise control. Millios expands Mattson’s philosophy of affording its customers the lowest Cost of Ownership paired with leading edge technology.
Millios features a direct temperature measurement and control throughout the ms-anneal cycle. The proprietary design of the front side temperature control enables our customers to achieve best device performance for their advanced technology nodes. This innovative capability is supported by industry leading throughput that provides Mattson’s customers the lowest CoO.
Millios enables a variety of applications due to its flexibility with process temperature, peak width and standard spike anneal heating. A wide temperature range from 250 to 1350°C covers process applications from NiSi formation through advanced Ultra-shallow junction annealing.