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Thermal Publications

Extendible Process Using UV-Enhanced Gate Dielectric

Low-Temperature RTP for Source/Drain Engineering

Thermal Budget Reduction Drives RTP Beyond the 45 nm Node

RTP-Grown Oxynitride Layers Meet Gate Challenges

RTP Applications and Technology Options for the Sub-45 nm Nodes

UV-Enhanced Oxynitridation of Silicon Substrates

USJ Formation: Annealing Beyond 90 nm

Rapid Thermal Solid Phase Epitaxy Annealing for Ultra-Shallow Junction Formation

Physical Characterization of ZrO2 Films On Silicon After Rapid Thermal Anneal

In Situ Real-Time Studies of Nickel Silicide Phase Formation

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